Conference paper
Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
Proceedings of SPIE, Vol.2793, pp.134-137
Society of Photo-optical Instrumentation Engineers
Photomask and X-Ray Mask Technology III (Kawasaki City, Japan, 18/04/1996–19/04/1996)
1996
Abstract
A simple method of optical constant evaluation is employed to measure refractive index (n) and absorption coefficient (k) of chromium oxide thin films deposited on transparent substrate in deep ultraviolet range. The validity of the method is verified by comparison with n. k values calculated from transmittance and phase shift measurement. The calculated n, k values of chromium oxide film were 3.3 and 0.64 at 193 nrn, respectively. It was found that there existed optimum film thickness in the range of 45-55 nm for DUV attenuated phase shift at 193 nm. Moreover the film quality has been improved to yield smooth and uniform film surface.
Details
- Title
- Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
- Authors/Creators
- S.B. Hong (Author/Creator) - Korea Advanced Institute of Science and Technology South KoreaE. Kim (Author/Creator) - Korea Advanced Institute of Science and Technology South KoreaW. Shin (Author/Creator) - Nagoya UniversityB.S. Bae (Author/Creator) - Korea Advanced Institute of Science and Technology South KoreaZ-T Jiang (Author/Creator) - Korea Advanced Institute of Science and Technology South KoreaK. No (Author/Creator) - Korea Advanced Institute of Science and Technology South KoreaS.C. Lim (Author/Creator) - Samsung (South Korea)S.G. Woo (Author/Creator) - Samsung (South Korea)Y.B. Koh (Author/Creator) - Samsung (South Korea)
- Publication Details
- Proceedings of SPIE, Vol.2793, pp.134-137
- Conference
- Photomask and X-Ray Mask Technology III (Kawasaki City, Japan, 18/04/1996–19/04/1996)
- Publisher
- Society of Photo-optical Instrumentation Engineers
- Identifiers
- 991005540117307891
- Copyright
- Society of Photo-optical Instrumentation Engineers
- Murdoch Affiliation
- Murdoch University
- Language
- English
- Resource Type
- Conference paper
- Note
- Citation: Seungbum Hong, Eunah Kim, Zhong-Tao Jiang, Byeong-Soo Bae, Kwangsoo No, Woosuck Shin, Sung-Chul Lim, Sang-Gyun Woo and Young-Bum Koh, "Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure", Proc. SPIE 2793, 134 (1996); doi:10.1117/12.245204
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