Pulsed PECVD for the growth of silicon nanowires

D. Parlevliet; J. Cornish

doi:10.1109/ICONN.2006.340543

Back

Pulsed PECVD for the growth of silicon nanowires

Conference paper

Open access

Pulsed PECVD for the growth of silicon nanowires

D. Parlevliet and J. Cornish

2006 International Conference on Nanoscience and Nanotechnology

IEEE

International Conference on Nanoscience and Nanotechnology ICONN '06 (Brisbane, Queensland, 03/07/2006–07/07/2006)

2006

DOI: https://doi.org/10.1109/ICONN.2006.340543

Files and links (2)

pdf

Pulsed_PECVD_for_the_Growth_of_Silicon_Nanowires.pdfDownload View

Published (Version of Record) Open Access

url

Link to Published Version *Subscription may be requiredView

Abstract

Silicon nanowires of high density and high aspect ratio similar to those shown in the literature (Niu et al., 2004, Hofman et al., 2003) have been grown using a variation of plasma enhanced chemical vapour deposition (PECVD) known as pulsed plasma enhanced chemical vapour deposition (PPECVD) using a range of different modulation frequencies. For the range of frequencies used it was found that the presence of modulated silane plasma increases the average density and sample coverage of silicon nanowires. Both of these effects are proposed as being due to the increase in the number of times the plasma is struck and turned off during the deposition process. For low temperature growth of silicon nanowires the presence of pulsed silane plasma improves the density and sample coverage of silicon nanowires.

Details

Title: Pulsed PECVD for the growth of silicon nanowires
Authors/Creators: D. Parlevliet (Author/Creator) - Murdoch University
J. Cornish (Author/Creator)
Publication Details: 2006 International Conference on Nanoscience and Nanotechnology
Conference: International Conference on Nanoscience and Nanotechnology ICONN '06 (Brisbane, Queensland, 03/07/2006–07/07/2006)
Publisher: IEEE
Identifiers: 991005542647807891
Murdoch Affiliation: Murdoch University
Language: English
Resource Type: Conference paper
Note: Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. Appear in Proceedings of the 2006 International Conference on Nanoscience and Nanotechnology, pp 35-38

Metrics

530 File views/ downloads

117 Record Views