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An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography
Conference presentation

An overview and future development of single layer halftone phase shifting mask materials for Deep UV microlithography

Z-T Jiang, S.B. Hong, E. Kim, B-S Bae, K. No, S. Lim, S-G Woo and Y-B Koh
The Korean Ceramic Society Conference
1996

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