Details
- Title
- Cr based attenuated phase shifting mask materials for 193nm lithography
- Authors/Creators
- E. Kim (Author/Creator)S.B. Hong (Author/Creator)Z-T Jiang (Author/Creator)K. No (Author/Creator)S. Lim (Author/Creator)S-G Woo (Author/Creator)Y-B Koh (Author/Creator)
- Conference
- Second international symposium on 193nm lithography (Colorado Springs, Colorado, 30/07/1996–02/08/1996)
- Identifiers
- 991005543509107891
- Murdoch Affiliation
- Murdoch University
- Language
- English
- Resource Type
- Conference presentation