Details
- Title
- Investigation of silicon rich nitride (SiRN) phase shifting mask material for 193nm lithography
- Authors/Creators
- Z-T Jiang (Author/Creator)T. Yamaguchi (Author/Creator)M. Aoyama (Author/Creator)L. Asinovsky (Author/Creator)
- Conference
- 3rd International Symposium on 193nm Lithography (Onuma, Hokkaido, Japan, 29/06/1997–02/07/1997)
- Identifiers
- 991005544428607891
- Murdoch Affiliation
- Murdoch University
- Language
- English
- Resource Type
- Conference presentation