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Large optical band gap Al Cr oxide thin films for Deep UV lithography applications
Conference presentation

Large optical band gap Al Cr oxide thin films for Deep UV lithography applications

Z-T Jiang, T. Yamaguchi, M. Aoyama and K. Ohshimo
22nd Condensed Matter Physics Meeting (Wagga Wagga, Australia, 04/02/1998–06/02/1998)
1998

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