Application of DV Xα cluster method to the Cr Al oxide mask materials for Deep UV lithography

Journal article

Peer reviewed

Z-T Jiang, T. Yamaguchi, E. Kim, S.B. Hong, K. No, Y. Kang, J. Park and Y-B Koh

Bulletin of the Society for Discrete Variational Xα, Vol.10(2)

1997

Details

Title: Application of DV Xα cluster method to the Cr Al oxide mask materials for Deep UV lithography
Authors/Creators: Z-T Jiang (Author/Creator)
T. Yamaguchi (Author/Creator)
E. Kim (Author/Creator)
S.B. Hong (Author/Creator)
K. No (Author/Creator)
Y. Kang (Author/Creator)
J. Park (Author/Creator)
Y-B Koh (Author/Creator)
Publication Details: Bulletin of the Society for Discrete Variational Xα, Vol.10(2)
Publisher: Society for Discrete Variational Xα
Identifiers: 991005543545607891
Murdoch Affiliation: Murdoch University
Language: English
Resource Type: Journal article
Note: Conference paper

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