Dependence of the properties of (SrxTi1−x)O3 thin films deposited by plasma-enhanced metal–organic chemical vapor deposition on electron cyclotron resonance plasma

J.S. Lee; H.W. Song; B-H Jun; D.H. Kwack; B.G. Yu; Z-T Jiang; K. No

doi:10.1016/S0040-6090(97)00002-3

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Dependence of the properties of (SrxTi1−x)O3 thin films deposited by plasma-enhanced metal–organic chemical vapor deposition on electron cyclotron resonance plasma

Journal article

Peer reviewed

Dependence of the properties of (SrxTi1−x)O3 thin films deposited by plasma-enhanced metal–organic chemical vapor deposition on electron cyclotron resonance plasma

J.S. Lee, H.W. Song, B-H Jun, D.H. Kwack, B.G. Yu, Z-T Jiang and K. No

Thin Solid Films, Vol.301(1-2), pp.154-161

1997

DOI: https://doi.org/10.1016/S0040-6090(97)00002-3

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Abstract

(SrxTi1−x)O3 (0.26≤x≤0.55) thin films were prepared on p-type Si (100) and Pt/SiO2/Si substrates. A stoichiometric perovskite SrTiO3 film with good thickness and composition uniformity was obtained on 4 inch wafer (±7% temperature uniformity) using electron cyclotron resonance (ECR) plasma which compensated for the substrate temperature difference. It was found that the activity of the precursors can be controlled by changing the ECR plasma power and O2-to-(Ar+O2) flow rate ratio. The deposition rate and the Sr-to-Ti composition ratio of the films were increased with the ECR plasma power and the O2-to-(Ar+O2) flow rate ratio of the ECR plasma, because the activation and decomposition of the source of strontium vapor are more easily affected by the ECR oxygen plasma power than those of the source of titanium vapor. The crystallinity and the orientation of the film were controlled by its Sr-to-Ti composition ratio and oxygen activity or oxygen partial pressure. The films showed a uniform and fine grain structure, and a Sr-to-Ti composition dependence.

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Title: Dependence of the properties of (SrxTi1−x)O3 thin films deposited by plasma-enhanced metal–organic chemical vapor deposition on electron cyclotron resonance plasma
Authors/Creators: J.S. Lee (Author/Creator) - Korea Advanced Institute of Science and Technology
H.W. Song (Author/Creator) - Korea Advanced Institute of Science and Technology
B-H Jun (Author/Creator) - Korea Advanced Institute of Science and Technology
D.H. Kwack (Author/Creator) - Korea Advanced Institute of Science and Technology
B.G. Yu (Author/Creator) - Electronics and Telecommunications Research Institute
Z-T Jiang (Author/Creator) - Korea Advanced Institute of Science and Technology
K. No (Author/Creator) - Korea Advanced Institute of Science and Technology
Publication Details: Thin Solid Films, Vol.301(1-2), pp.154-161
Publisher: Elsevier BV
Identifiers: 991005540177307891
Copyright: 1997 Elsevier Science S.A.
Murdoch Affiliation: Murdoch University
Language: English
Resource Type: Journal article

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Collaboration types: Domestic collaboration
Citation topics: 5 Physics; 5.77 Applied Physics; 5.77.20 Lead-Free Ferroelectrics
Web Of Science research areas: Materials Science, Coatings & Films; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter
ESI research areas: Materials Science