Effects of gas ring position and mesh introduction on film quality and thickness uniformity

S. Hong; E. Kim; Z-T Jiang; B-S Bae; K. No; S. Lim; S-G Woo; Y-B Koh

doi:10.1016/S0921-5107(96)01913-7

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Effects of gas ring position and mesh introduction on film quality and thickness uniformity

Journal article

Peer reviewed

Effects of gas ring position and mesh introduction on film quality and thickness uniformity

S. Hong, E. Kim, Z-T Jiang, B-S Bae, K. No, S. Lim, S-G Woo and Y-B Koh

Materials Science and Engineering B, Vol.45(1-3), pp.98-101

1997

DOI: https://doi.org/10.1016/S0921-5107(96)01913-7

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Abstract

Chromium oxide films were deposited using DC reactive magnetron sputtering system with different gasring positions. It was found that the film quality was improved, while film thickness deviation over 2′' area of silica wafer increased, as the distance between the target and the gasring increased. To improve both the film quality and the thickness uniformity, a method of mesh insertion was tried and verified to meet the purpose. Introduction of mesh produced stable plasma and resulted in more uniform and smooth planar film without any contamination from the mesh. These phenomena were explained in terms of gettering and scattering effects of the mesh.

Details

Title: Effects of gas ring position and mesh introduction on film quality and thickness uniformity
Authors/Creators: S. Hong (Author/Creator) - Korea Advanced Institute of Science and Technology
E. Kim (Author/Creator) - Korea Advanced Institute of Science and Technology
Z-T Jiang (Author/Creator) - Korea Advanced Institute of Science and Technology
B-S Bae (Author/Creator) - Korea Advanced Institute of Science and Technology
K. No (Author/Creator) - Korea Advanced Institute of Science and Technology
S. Lim (Author/Creator) - Samsung (South Korea)
S-G Woo (Author/Creator) - Samsung (South Korea)
Y-B Koh (Author/Creator) - Samsung (South Korea)
Publication Details: Materials Science and Engineering B, Vol.45(1-3), pp.98-101
Publisher: Elsevier
Identifiers: 991005541894807891
Murdoch Affiliation: Murdoch University
Language: English
Resource Type: Journal article

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Collaboration types: Industry collaboration; Domestic collaboration
Citation topics: 5 Physics; 5.188 Deposition, Hardening & Coating; 5.188.318 Nitride Coatings
Web Of Science research areas: Materials Science, Multidisciplinary; Physics, Condensed Matter
ESI research areas: Materials Science