Experimental study on the reaction of CCl3F and CH4 in a dielectric barrier discharge nonequilibrium plasma reactor

S.K. Kundu; E.M. Kennedy; J.C. Mackie; C.I. Holdsworth; T.S. Molloy; V.V. Gaikwad; B.Z. Dlugogorski

doi:10.1021/acs.iecr.5b04010

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Experimental study on the reaction of CCl3F and CH4 in a dielectric barrier discharge nonequilibrium plasma reactor

Journal article

Peer reviewed

Experimental study on the reaction of CCl3F and CH4 in a dielectric barrier discharge nonequilibrium plasma reactor

S.K. Kundu, E.M. Kennedy, J.C. Mackie, C.I. Holdsworth, T.S. Molloy, V.V. Gaikwad and B.Z. Dlugogorski

Industrial & Engineering Chemistry Research, Vol.55(2), pp.463-471

2016

DOI: https://doi.org/10.1021/acs.iecr.5b04010

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Abstract

The reaction of CCl3F (CFC-11) with CH4 (in an argon bath gas) in a dielectric barrier discharge nonequilibrium plasma was examined. Oxygen and nitrogen were excluded from the feed stream and the reactions resulted in the production of fluorine-containing polymers, as well as a range of gaseous products including H2, HCl, HF, C2H3F, C2H3Cl, C2H2ClF, CHCl2F, CCl2F2, CH3Cl, CH2Cl2, CHCl3, and C2Cl4. The polymeric material synthesized during reaction is characterized as being non-cross-linked and random in nature, containing functional groups including CH3, CH2, CHCl, CHF, CF2, and CF3. The conversion level of CCl3F increased from 37% to 63% as the input energy density increased from 3 to 13 kJ L-1 (the applied voltage range was 14.1 to 15.2 kV, peak-peak). The electrical discharge was characterized and found to be a slight modification of filamentary discharge toward a diffuse discharge due to the presence of the relatively low concentration of CCl3F and CH4 (less than 2% each) in argon. A reaction mechanism is proposed describing the formation of gas phase, as well as polymeric products.

Details

Title: Experimental study on the reaction of CCl3F and CH4 in a dielectric barrier discharge nonequilibrium plasma reactor
Authors/Creators: S.K. Kundu (Author/Creator)
E.M. Kennedy (Author/Creator)
J.C. Mackie (Author/Creator)
C.I. Holdsworth (Author/Creator)
T.S. Molloy (Author/Creator)
V.V. Gaikwad (Author/Creator)
B.Z. Dlugogorski (Author/Creator)
Publication Details: Industrial & Engineering Chemistry Research, Vol.55(2), pp.463-471
Publisher: American Chemical Society
Identifiers: 991005542500307891
Murdoch Affiliation: School of Engineering and Information Technology
Language: English
Resource Type: Journal article

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Collaboration types: Domestic collaboration
Citation topics: 5 Physics; 5.202 Plasma Physics; 5.202.388 Plasma Discharges
Web Of Science research areas: Engineering, Chemical
ESI research areas: Chemistry