Journal article
Simulation and fabrication of attenuated phase-shifting masks: CrF_x
Applied Optics, Vol.36(28), pp.7247-7256
1997
Abstract
To acquire the required resolution for 248- and 193-nm lithography, a study of attenuated phase-shifting mask (Att-PSM) technology is in progress. We performed a simulation study using a matrix method to calculate relative transmittance and the amount of phase shift of light through the PSM. However, we found that the average film composition changed with deposition time. Accordingly, optical constants were found to be a strong function of film thickness. Therefore we rearranged the relationship between deposition parameters (e.g., deposition time or gas flow rate ratio) and optical constants (e.g., refractive index and extinction coefficient) to extract the empirical formula for the optical constants with respect to film composition. To verify our simulation study, we fabricated a phase shifter based on our simulation result, which was found to have a transmittance of 8.3% and a phase shift of 179.5°. Consequently, we obtained a reliable optimum condition for the deep-ultraviolet Att-PSM.
Details
- Title
- Simulation and fabrication of attenuated phase-shifting masks: CrF_x
- Authors/Creators
- E. Kim (Author/Creator) - Korea Advanced Institute of Science and TechnologyS. Hong (Author/Creator) - Korea Advanced Institute of Science and TechnologyK-S Kim (Author/Creator) - Korea Advanced Institute of Science and TechnologyZ-T Jiang (Author/Creator) - Korea Advanced Institute of Science and TechnologyD.W. Kim (Author/Creator) - Korea Advanced Institute of Science and TechnologyS. Lim (Author/Creator) - Korea Advanced Institute of Science and TechnologyS-G Woo (Author/Creator) - Korea Advanced Institute of Science and TechnologyY-B Koh (Author/Creator) - Korea Advanced Institute of Science and TechnologyK. No (Author/Creator) - Korea Advanced Institute of Science and Technology
- Publication Details
- Applied Optics, Vol.36(28), pp.7247-7256
- Publisher
- Optical Society of America
- Identifiers
- 991005543671607891
- Copyright
- 1997 Optical Society of America
- Murdoch Affiliation
- Murdoch University
- Language
- English
- Resource Type
- Journal article
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- Collaboration types
- Industry collaboration
- Domestic collaboration
- Citation topics
- 5 Physics
- 5.295 Lithography
- 5.295.709 EUV Lithography
- Web Of Science research areas
- Optics
- ESI research areas
- Physics