Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Z-T Jiang; S. Hong; E. Kim; B-S Bae; S. Lim; S-G Woo; Y-B Koh; K No

doi:10.1016/S0169-4332(96)00933-6

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Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Journal article

Peer reviewed

Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation

Z-T Jiang, S. Hong, E. Kim, B-S Bae, S. Lim, S-G Woo, Y-B Koh and K No

Applied Surface Science, Vol.113-14, pp.680-684

1997

DOI: https://doi.org/10.1016/S0169-4332(96)00933-6

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Abstract

The investigation of single layer halftone phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and ArF (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.

Details

Title: Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
Authors/Creators: Z-T Jiang (Author/Creator) - Korea Advanced Institute of Science and Technology
S. Hong (Author/Creator) - Korea Advanced Institute of Science and Technology
E. Kim (Author/Creator) - Korea Advanced Institute of Science and Technology
B-S Bae (Author/Creator) - Korea Advanced Institute of Science and Technology
S. Lim (Author/Creator) - Samsung (South Korea)
S-G Woo (Author/Creator) - Samsung (South Korea)
Y-B Koh (Author/Creator) - Samsung (South Korea)
K No (Author/Creator) - Korea Advanced Institute of Science and Technology
Publication Details: Applied Surface Science, Vol.113-14, pp.680-684
Publisher: Elsevier BV
Identifiers: 991005540325007891
Murdoch Affiliation: Murdoch University
Language: English
Resource Type: Journal article

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Collaboration types: Industry collaboration; Domestic collaboration
Citation topics: 5 Physics; 5.295 Lithography; 5.295.709 EUV Lithography
Web Of Science research areas: Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
ESI research areas: Materials Science