Journal article
The application of silicon rich nitride films for use as deep-ultraviolet lithography phase-shifting masks
Japanese Journal of Applied Physics, Vol.37(Part 1), pp.571-576
1998
Abstract
Silicon rich nitride (SiRN) film prepared by plasma enhanced chemical vapor deposition (PECVD) for use as the phase-shifting mask for Deep-ultraviolet (UV) lithography has been developed. Optical properties and compositional characterizations of the SiRN films using Auger electron spectroscopy (AES) and spectroscopic ellipsometry (SE) combined with an empirical dielectric function (EDF), as well as phase-shifting mask simulation show that the SiRN is feasible for use in the application of single layer halftone phase-shifting mask (SLHTPSM) in the Deep-UV range. Optical constants of n ≈ 2.5 and k < 0.6 at 193 nm were realized by approaching the N/Si composition to the stoichiometric ratio of Si3N4. The deposition conditions for the films having the transmittance of 5 - 10% with a 180° phase shift at 193 nm (ArF) have been determined. Short wavelength extrapolation by EDF best-fit parameters based on a proper film-stack model provides a potential method to characterize the optical properties of amorphous SiRN down to about 190 nm, which is outside the range of most commercial SE's.
Details
- Title
- The application of silicon rich nitride films for use as deep-ultraviolet lithography phase-shifting masks
- Authors/Creators
- Z-T Jiang (Author/Creator)T. Yamaguchi (Author/Creator)K. Ohshimo (Author/Creator)M. Aoyama (Author/Creator)L. Asinovsky (Author/Creator) - Rudolph Technologies, Inc.
- Publication Details
- Japanese Journal of Applied Physics, Vol.37(Part 1), pp.571-576
- Publisher
- Japan Society of Applied Physics
- Identifiers
- 991005543818707891
- Copyright
- 1998 Publication Board
- Murdoch Affiliation
- Murdoch University
- Language
- English
- Resource Type
- Journal article
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- Collaboration types
- International collaboration
- Citation topics
- 5 Physics
- 5.295 Lithography
- 5.295.709 EUV Lithography
- Web Of Science research areas
- Physics, Applied
- ESI research areas
- Physics